Keysight Technologies announced that Samsung Foundry has adopted the Keysight E4727B Advanced Low-Frequency Noise Analyzer (A-LFNA) for measurement and analysis of flicker noise (1/f noise) and random telegraph noise (RTN) in semiconductor devices.
Samsung Foundry customers targeting the silicon manufacturer’s advanced technologies will have access to process design kits (PDK) that include the most accurate simulation models, based on A-LFNA data, for design and verification of radio frequency (RF) and analog circuits.
Samsung Foundry is spending on Keysight solution because accurate low-frequency noise measurement and modeling are increasingly important in development of PDKs, especially for the advanced technology nodes at 5, 4, and 3 nanometers.
“Samsung Foundry’s use of our A-LFNA enables design engineers with the highest quality PDKs for circuit design to achieve first-pass success and reduce time-to-market,” Charles Plott, Director of Product Management for PathWave Software Solutions at Keysight, said in a news statement.
The Keysight E4727B A-LFNA solution measures the low-frequency noise of semiconductor devices. The PathWave A-LFNA Measurement and Programming software is built on top of the PathWave WaferPro (WaferPro Express) measurement platform.
Engineers manage and automate the wafer-level device characterization workflow in a measurement system that is both flexible and expandable. Next, engineers import the measurement data from the system into Keysight’s PathWave Device Modeling (IC-CAP) and PathWave Model Builder (MBP) software to extract device models for PDK development, which ensures highly accurate RF and analog low-noise circuit design and simulation.
“Keysight’s A-LFNA has 100MHz wide frequency bandwidth and enables noise measurements at higher frequencies. The measurement speed of the A-LFNA is also breakneck compared to previous generation systems,” said Hyung Jin Lee, Vice President of Technology at Samsung Foundry.
